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| List of 8inch process equipments (CMOS/MEMS) |
| Process |
Equipment |
Remarks
(Materials, Method) |
CMOS |
MEMS |
| Diffusion |
Implantation |
Implantation |
P/B/BF/As/
In/Sb/Ge |
 |
 |
|
| Annealing |
Furnace/RTP |
P/B/As |
|
|
| Deposition |
Oxidation |
Furnace |
Wet/Dry |
 |
|
|
Insulation film
depositing |
LPCVD |
TEOS/SiN/
BPSG |
|
|
Poly-Si/
SiO2 |
|
|
| PECVD |
SiN |
|
|
| SiO2 |
|
|
| TEOS |
|
|
| Metal |
CVD |
W |
|
|
| Sputter |
AlCu/Ti/
TiN/W/
WSi/Co |
|
|
| Au/Cr/Ge |
|
|
| Photolithography |
Coating/
Developing |
Coater/
Developer |
Positive resists/
Negative resists |
 |
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| polyimide coater |
|
|
|
Mask alignment/
exposure |
Aligner |
|
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|
| Stepper |
|
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|
KrF excimer
laser |
|
|
|
| Wet etching |
SiO2 |
HF etch station |
|
 |
|
|
| Silicon |
TMAH etch
station |
|
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|
| Metal |
Metal etch
station |
Au/Cr |
|
|
| Dry etching |
Insulation film |
Plasma etcher |
SiO2/SiN/
Poly-Si |
 |
|
|
| Organic thin film |
O2 plasma
stripper |
resists |
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| Silicon |
D-RIE |
|
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| RIE |
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| Metal |
RIE |
Al |
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| CMP Planarization |
STI, ILD, W-plug |
CMP |
|
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|
Characterization/
Dicing/Cleaning |
Characterization |
Film thickness measurement |
Insulating film/
Resists |
 |
|
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| CV measurement |
|
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|
| Dicing |
Lacer Dicer |
Silicon |
|
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| Cleaning |
Automated Cleaning Statio |
Silicon |
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|
 Limited Liability |
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| List of 5inch process equipments (Bipolar) |
| Process |
Equipment |
Remarks(Materials, Method) |
| Diffusion |
Implantation |
Ion Implantation |
Phos/Boron/As |
|
| Doped deposition |
Furnaces |
Phos/Boron |
| Annealing |
Furnaces |
Phos/Boron/As |
| Deposition |
Oxidation |
Furnaces |
Wet/Dry |
|
| Insulation film depositing |
LPCVD |
PSG/NSG/SiN |
| PECVD |
SiN |
| Metal |
Sputter |
Al/Al-Si/TiW/Pt |
| Photolithography |
Coating/Developing |
Coater/Developer |
Positive resists/
Negative resists |
|
| polyimide coater |
polyimide |
Mask alignment/
exposure |
MPA, PLA |
|
| Wet etching |
SiO2 |
HF etch station |
|
|
| Silicon |
TMAH etch station |
|
| Metal |
Metal etch station
Spin etcher |
Al |
| Dry etching |
Insulation film |
Plasma etcher |
SiO2/SiN |
|
| Organic thin film |
O2 plasma stripper |
Resists |
| Silicon |
RIE |
|
Characterization/
Dicng/Cleaning |
Characterization |
Film thickness measurement |
Insulating film/Resists |
|
| Dicing |
Dicer |
Silicon, Glass |
| Cleaning |
Automated Cleaning Station |
RCA |
| Manual Cleaning Station |
H2SO4/HNO3/HF |
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English
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